Used FSI / TEL / TOKYO ELECTRON Zeta 300 G3 #9397351 for sale

FSI / TEL / TOKYO ELECTRON Zeta 300 G3 photoresist equipment is a state-of-the-art automated production tool designed to facilitate the fabrication of semiconductor devices. FSI Zeta 300 G3 features a high resolution 10-micron stepper with multiple alignment options and a multilayered pellicle system for advanced photolithography. The photoresist unit is capable of producing complex patterns quickly and with great accuracy. TEL Zeta 300 G3 is outfitted with a highly precise lens assembly that doubles as a microscope and output platform. This allows the user to easily view and manipulate the processed photoresist. The machine also includes an automated cassette to cassette transfer tool, allowing users to load and unload circuits quickly and precisely. Zeta 300 G3 provides superior resolution to produce submicron features measured in nanometers. The asset employs multiple wavelength and polarization settings to ensure accurate positioning and replication of resist mask patterns. The chamber interior is purged with a high degree of oxygen control for clean and efficient resist processing. The advanced multilayer pellicle model of TOKYO ELECTRON Zeta 300 G3 allows layers of photoresist to be evenly and accurately deposited. The internal shutter is electronically controlled, allowing high throughput and accuracy in the photolithography process. The templates of patterns can be easily imported into the equipment through a selection of CAD software, or they can be generated internally. FSI / TEL / TOKYO ELECTRON Zeta 300 G3 is a true powerhouse of photoresist processing. Its advanced imaging and alignment systems provide unparalleled accuracy, while its pellicle system ensures that resist layers are evenly deposited. The unit can quickly process complex patterns with the utmost accuracy, allowing for efficient production of semiconductor devices.