Used FSI / TEL / TOKYO ELECTRON Zeta 300 #293639153 for sale

FSI / TEL / TOKYO ELECTRON Zeta 300 is a specialized photoresist equipment designed for high-precision lithography work. This system is made up of a number of components, including a main controlling unit, a light source, microscope, chamber, wafer stage, and wafer carriers. The main controller contains a computer to monitor the unit, as well as programmable controls to adjust the parameters of the machine. The light source is a UV light designed to expose the photoresist to the correct wavelength in order to create a pattern. The microscope is used to precisely focus the light onto the photoresist, and can be adjusted for optimal image resolution. The chamber is a large container to house the components within and maintain a clean, dust-free environment. The wafer stage is utilized to move the workpiece during processing, and the wafer carriers are used to ensure the photoresist is in the optimal position within the chamber. In addition to its components, FSI Zeta 300 also has several features to improve its performance. These features include a high-density projection tool, nano-electron microscope support, and real-time monitoring of the asset. TEL Zeta 300 offers high-precision lithography, with a minimum line width of 0.2 µm, and a high-resolution of 100 nanometers. It is able to maintain an alignment accuracy of less than 0.02 µm, and a focus depth of 0.6 µm, allowing for repeatable and reliable results. In addition, it is able to quickly move the workpiece, achieving a scan speed of up to 25mm per second. TOKYO ELECTRON Zeta 300 is designed to be used in combination with other tools in a lithography process, including a substrate cassette, cleaning modules, and resist processing units. All of these components are integrated through a single user interface to ensure efficient yet reliable operation. Furthermore, the model is able to handle a wide range of photoresist materials, including liquid and dry type. Overall, Zeta 300 is an advanced photoresist equipment well-suited to a variety of lithography applications. It features an array of features and components that make it easy to use, while providing high-precision and reliable results.