Used FSI / TEL / TOKYO ELECTRON Zeta 300 #9140979 for sale

FSI / TEL / TOKYO ELECTRON Zeta 300 Photoresist Equipment is a high-precision resist etching system that can produce precise patterns to create intricate photomasks. The unit is equipped with an advanced control machine that can control each step of the etching process, from sample preparation to the final disposition of the mask. It has a powerful resist spreader, which uses impinging jets to uniformly spread photoresist across the surface of a substrate. It also has an incremental exposure control tool, which allows for repeatable exposure of the substrate to various wavelengths of light to ensure precise patterning. The asset also features an integrated image analyzer, which can measure the size, form, and boundary of the pattern etched on the substrate. This allows for precise control of the etching process to produce precise patterns for the final photomasks. The model can etch both positive and negative resist through use of a positive-resist spray and a negative-resist spray, respectively. In addition, the equipment can apply a variety of post-etch treatments, such as overcoat, ashing, and baking to improve the lifecycle and stability of the substrate. FSI Zeta 300 Photoresist System is designed for use in the semiconductor industry due to its high degree of precision and accuracy. Its superior performance and wide range of features make it ideal for producing photomasks with accurately defined features and shapes. The unit also has a high throughput, allowing for faster production of photomasks. In addition, its chemical compatibility allows for a wide range of photoresist materials to be used. Furthermore, its user-friendly interface allows for easy setup and operation of the machine, and the high level of automation makes it easier for operators to consistently produce repeatable high-precision patterns.