Used FSI / TEL / TOKYO ELECTRON Zeta 300 #9149325 for sale

FSI/TOYKO ELECTRON FSI / TEL / TOKYO ELECTRON Zeta 300 is a photoresist system that specializes in the anti-reflective (AR) coating of optical components. FSI Zeta 300 is specifically designed to assist in optimizing the characteristics of the AR layer and decrease any visibility of the coatings beneath it. TEL Zeta 300 utilizes a two-part photoresist coating process known as PR (post-exposure resist), which involves a special priming process as well as resist baking. During the priming process, a special form of chemical vapor deposition (CVD) is used to create a thin layer of carbonaceous material that acts as a barrier to the vapor molecules of the process chemicals. This helps to ensure optimal uniformity for the chosen coating. The resist baking process follows the priming and is used to control the thickness and adhesion characteristics of the PR layer. This process utilizes an infrared laser at a wavelength of 10.6 microns, which causes the resist material to heat up and form an "etching mask" over the optical surface. This step helps to prevent any undesirable effects during the coating process that result from poor adherence of the PR layer. TOKYO ELECTRON Zeta 300 also incorporates a unique R&D (reflection and diffusion) feature that evaluates the optical performance of the PR layer. This feature allows the user to adjust the absorption levels of the selected coating, ensuring optimum levels of light reflection and diffusion capabilities. Finally, Zeta 300 is also equipped with automated stereo-lithography systems, which enable precise 3D imaging of the optical materials. This type of imaging helps to identify and correct any surface imperfections that might otherwise alter the performance of the AR coating. The combination of these features, along with the advanced precision of FSI / TEL / TOKYO ELECTRON Zeta 300 photoresist system, makes it an ideal choice for applications where accuracy and performance of the AR layer are essential.