Used FU SHENG FR100APII #9247060 for sale

FU SHENG FR100APII is an advanced photoresist equipment that utilizes holographic technology for laser writing and recording. This system provides precision submicron resolution for imaging, aligning, and charing of organic layers, and is capable of producing patterns with superior line widths and aspect ratios. The unit consists of two subsystems, the Fluorescence Layer Writing/Charging Subsystem (FLW/CS) and the Laser Exposure Subsystem (LES). The FLW/CS uses laser beams to charge organic layers used in photoresist processes. It utilizes a specially designed digital scanning machine and fluctuation energy detectors to precisely control the entire charging process. The LES uses three types of interference-filtered lasers—UV, HeNe, and KrF—to expose photoresist to optical radiation, which allows it to harden when exposed. The lasers are designed to produce low-pulse rates and very small spot size. The FR100APT tool also features an automated wafer or substrate loading and transfer asset and an Auto-Indexed Multiple-Field Stepper (AIMFS) for creating multiple pattern fields. This is extremely useful for chip designs that require a large number of stages and a high degree of precision. The model's optical equipment is equipped with high power objectives to increase the accuracy of the writing and pattern creation process. The system also features a digital imaging unit that enables users to monitor the photoresist and to make any necessary adjustments to the exposure parameters. The FR100APT can store up to 30 programs, which are usually related to a particular photoresist process that needs to be repeated. This saves time and energy because users will only need to input the pertinent parameters once, rather than re-inputing them each time the process needs to be repeated. Consequently, complex photoresist processes are managed at a faster rate and with more precision than ever before. Overall, FR100APII photoresist machine utilizes cutting edge technology to produce precision submicron patterns and images with superior line widths and aspect ratios. It is an invaluable tool in the photoresist industry, enabling users to create multiple, complex patterns with speed and accuracy.