Used GELON GN-135 #9392734 for sale

GELON GN-135 is a high-precision photoresist equipment used for precision etching or patterning on various substrates. It is particularly suited for lithography applications that require accuracy and high-resolution results. The system features a unique nanolayer design which allows for high process speeds and long-term reliability. GN-135 is based on a direct-write lithography unit which uses UV light to create patterns on the substrate. The light is shined through a mask containing the desired pattern, and the UV light is blocked or passed by through the mask and onto the substrate. This technique allows for variable and precise patterning without relying on expensive photomasks. GELON GN-135 consists of a number of components working together to deliver outstanding etching and patterning results. The first component is a steering mechanism that allows for accurate positioning and alignment of the mask to the substrate. The second component is the polymer-based resist material that is used to protect the areas of the substrate that are to be left un-etched or untouched. This resist material is sensitive to UV light and "sets in" upon exposure, preventing etching in the protected areas. The third component of GN-135 is the light source. The use of light with wavelengths in the UV range (up to around 300nm) ensures that the light is able to penetrate the resist material, allowing for precise patterning with a high degree of accuracy. The fourth component is the etching device. This device works differently depending on the material being etched, but in most cases it will involve some sort of chemical reaction to "etch away" the unprotected areas of the substrate. The final component of GELON GN-135 is its precision control machine. This tool makes sure that the entire etching process is performed in an accurate and precise manner. It allows for fine tuning of mask alignment, light intensity, and etching speed. This enables a degree of accuracy that is hard to match with manual techniques. In conclusion, GN-135 is a high-precision photoresist asset used for accurate etching and patterning of delicate substrates. It consists of a number of components working together to deliver precise results, and its precision control model ensures a degree of accuracy and reliability that can not be achieved with manual processes.