Used GREENHECK / PICOTRACK Vektor-H-12-9 #9265693 for sale

GREENHECK / PICOTRACK Vektor-H-12-9 photoresist equipment is an advanced imaging process used to mask surfaces for etching and other formation processes. Using the latest advancements in imaging technology, GREENHECK Vektor-H-12-9 is designed to provide high resolution imaging of complex patterns directly onto wafers or substrates with minimal variations. The photoresist system utilizes light to transfer a desired pattern to the surface of a material with exposable imaging media such as a photoresist mask, photomask film, and a photomask blank. The light source used to create the images is typically an excimer laser, a high-energy laser pulse that is powerful enough to ablate the light sensitive media in order to produce nanometer-scaled patterns. The patterns are developed using lithographic systems with laser focusing capability. Depending on the desired design, the beam of light is focused through a high resolution lenses so that images are drawn in precise detail with exacting accuracy. The purpose of this imaging process is to generate patterns that cells will adhere to during etching and material formation processes. PICOTRACK Vektor-H-12-9 is engineered with an integrated high-resolution patterning unit that allows for easy manipulation of photoresist masks. After the photomask film has been loaded into the machine, users can control the exposure of the film to the laser beam, the thickness of the film, and other parameters to ensure that the images are accurately depicted on the substrate. The tool utilizes a near-field optics approach for controlling the photoresist processes, which allows for better control of the patterning and reduces the formation of defects. Additionally, Vektor-H-12-9 includes temperature control and an advanced path planning device, which helps maintain the accuracy and quality of the images throughout the imaging process. GREENHECK / PICOTRACK Vektor-H-12-9 is a powerful tool for patterning wafers and substrates with nanometer-scaled images of great precision. The asset is designed for automated manufacturing processes and for extreme accuracy in the transfer of patterns onto materials. The near-field optics approach and integrated control features help ensure the quality of the images produced with the photoresist model.