Used GRO-UP GSPC-6 / GCP-713B #171530 for sale

GRO-UP GSPC-6 / GCP-713B Photoresist Equipment is a comprehensive system for the preparation, coating and exposure of photoresist materials. This unit is designed for performing high-resolution circuit patterning on electronic intermediate film (EIF) substrates. The major components of this machine include a metering tool, an oven, a coater and an exposure source. The metering asset accurately meters and blends up to four base components at a time to allow for recipe customisation. The precision metering cylinders have adjustable level controls and a direct-drive servo to ensure precise and repeatable metering, even at low levels. The metered photoresist material is then ready for coating. The oven is used to heat the photoresist material to a temperature suitable for coating and processing. Heating can be done in two stages, allowing for both pre-drying of the material as well as post-curing of the coating. This can also be used to increase throughput of the model by batch processing multiple substrates simultaneously. The coater applies a uniform and consistent coating of the photoresist material to the substrate. The deposit is automatically controlled and monitored for thickness, film composition, surface composition, and parameters such as snake angle, twist, and direction. The stepper and motion control equipment automatically adjusts the pressure and flow to consistently achieve accurate and consistent results. The exposure system consists of an ultra violet light source, a reflector and a mirror. The light source delivers intense UV radiation that saturates the entire substrate surface. This allows self-alignment between the exposed and unexposed areas of the substrate during post-processing. The light source is also adjustable to provide controlled, low-power exposure for micron-level fine patterning. GSPC-6 / GCP-713B Photoresist Unit is an ideal solution for advanced circuit patterning needs. It provides precise and consistent performance, high throughput and consistent results. This machine is suitable for EIF photoresist processing and is suitable for applications requiring precision and high-resolution circuit patterning. The advanced metering, oven, coater and exposure tool provide the best combination of equipment and functions for efficient processing of advanced photoresist materials.