Used HEADWAY CB 15 #9392727 for sale

Manufacturer
HEADWAY
Model
CB 15
ID: 9392727
Photoresist spinners.
HEADWAY CB 15 Photoresist Equipment is an advanced and robust chemical vapor deposition (CVD) system designed to produce high-quality photoresist layers on solid-state substrates. It enables the growth of films with minimal time, effort and cost. The unit utilizes proprietary process control features, automated end-of-run diagnostics, and custom-fitted components to achieve superior photoresist layer adhesion strength and uniformity. The machine consists of an automated process chamber, a vacuum tool, an air-supplied heating chamber, and control and monitoring software. The CVD process involves the deposition of a thin film of photoresist material on a substrate surface. This is followed by a series of corrosive cleaning or finishing steps and the application of a protective or photo-masking layer. In CB 15 asset, the process is initiated by feeding an atmospheric vapor containing photoresist precursor into the process chamber. This creates a vaporized gas of reactant molecules suspended in the air. The device is highly efficient with a one-time evacuation cycle and minimal recovery time. Its pressure-variable manifold and built-in heaters allow users to precisely control the pressure and temperature ranges within the process chamber. This helps to ensure uniform deposition of the photoresist layer on the substrate and reliable adhesion properties. The model's end-of-run diagnostics automatically detect unwanted side-effects of the process such as bubbles and voids. HEADWAY CB 15 equipment can be used with a variety of photoresist materials, from conventional Organic Photo Resist (OPR) to photoresist polymers and inorganic materials. Its ability to accurately and uniformly deposit even very thin photoresist layers makes it ideal for high-end applications requiring exact layer thickness. CB 15 is capable of processing materials such as quartz, silicon, gallium arsenide, silicon nitride, and germanium, and is compatible with standard photolithographic and wet-etch processing. The system can be operated remotely and is supported by a comprehensive user manual to ensure correct and efficient operation. Its automated end-of-run diagnostics and real-time logging of process parameters ensure further ease of operation. Lastly, the device comes with a series of custom-fitted accessories and replacement units in case of any hardware failure. HEADWAY CB 15 Photoresist Unit is thus the perfect choice for precision deposition of photoresist layers on solid-state substrates.
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