Used HEADWAY EC 101 #114662 for sale

HEADWAY EC 101 is a photoresist equipment designed for microelectronic fabrication processes. It is a water-soluble, organosulfur polymeric photoresist material developed for the protection of functionalized substrates during lithography and etch processes. HEADWAY EC101 system consists of two components - the resist liquid and the developer liquid. The resist liquid contains the polymeric photoresist material, which is applied to the substrate. Once it has been exposed to UV radiation, the polymeric material crosslinks and acts as a protective layer. The developer liquid is used to dissolve the polymeric photoresist material once the lithography or etching process has been completed. This process is known as 'development' and is necessary in order to remove any of the unwanted resist material that may have remained on the substrate after the lithography or etching has taken place. The advantages of EC 101 unit include its low cost, quick processing times, and high resolution results. Additionally, the resist liquid and developer liquid are compatible with a broad range of lithography and etch technologies, including Advanced Lithography, Deep Reactive Ion Etching (DRIE), and Chemical Mechanical Planarization (CMP). The low cost of EC101 compared to other photoresist systems makes it a very attractive option for semiconductor chip manufacturers. It is also a reliable choice for advanced lithography applications, as its high resolution results enable manufacturers to create more intricate designs on their chips. Moreover, HEADWAY EC 101 machine is chemical-screen compatible, enabling OEMs to reduce the amount of their cost associated with developing custom solutions. Additionally, with quick processing times, it allows for high throughput, meaning manufacturers can be more efficient with their resources. In summary, HEADWAY EC101 tool is an excellent choice for all types of semiconductor chip fabrication, offering great cost savings and excellent resolution results. Additionally, its wide compatibility with a range of different lithography and etch technologies makes it reliable and adaptable to all kinds of needs.