Used HEADWAY EC 101 #9123974 for sale

HEADWAY EC 101 is a high performance resist coating designed specifically for electronic industry applications. It is an excellent solution for both planar and 3D substrates requiring extremely fine resolution geometry. Its multi-layer, negatively-working coating equipment incorporates a high performance B-stage polyimide dielectric material along with a halftone or toner-compatible resist. One of the key features of HEADWAY EC101 is its highly patternable and repeatable performance. It provides high resolution in both vertical and horizontal directions, making it ideal for metallization on intricate shapes on very flat surfaces with a wide range of aperture and line widths. The coating can be patterned with very high dissipation acoustic waves or with photolithographic methods. This versatility allows for a wide variety of chip packages, component assemblies, and testing and inspection applications, as well as production of MEMS and other micro-scale components. EC 101 is designed to provide a reliable and effective photoresist system. The dielectric layer is highly resistant to chemical etching, and the resist layer can be protected against contaminants and damage during post-processing. The layers are designed to be compatible with industry-standard processing aids such as photorregisters and related photoresist processing components. EC101 can be used in conjunction with other advanced resist systems for more complex applications. It also works well with other electronic processes such as forming, shaping, and drilling. Additionally, its nanofabrication capabilities provide a wide range of applications for the integration of MEMS components. HEADWAY EC 101 is designed to provide a reliable photoresist unit with exceptional pattern resolution. Its nano-scale fabrication capabilities provide advanced capabilities for microelectronics industry applications. It is ideal for use in the manufacture of MEMS, chip packages, components assemblies, and testing and inspection applications. It is designed for repeatable and high fidelity resolution performance, and is an excellent solution for manufacturers looking for a reliable and efficient photoresist machine.