Used HEADWAY EC 102 #9123998 for sale

HEADWAY EC 102 is a single-coating, negative photoresist equipment designed to increase production yield from high aspect ratio trenches in microlithography optical printing applications. The photoresist system consists of a positive photoresist, EC 102, and a developing chemistry that work together to provide enhanced resolution, low line edge roughness (LER), and improved line-width control. The positive photoresist, HEADWAY EC 102, is composed of a long-chain polymer, a photo-acid generator, and a additive amalgamation that provides enhanced planarization. The long-chain polymer structure results in higher resolution and better line edge roughness (LER) than thermally cured systems, while the photo-acid generator and additive amalgamation enhance planarization by providing higher etching selectivity ratios. The chemistry of EC 102 photoresist unit is optimized to provide high etching selectivity, long-term stability, and excellent adhesion to a variety of substrates. The machine has low-temperature baking requirements, meaning that it will not be affected by high temperatures during processing. Additionally, the photoresist can withstand up to 300°C during backside ashing and lift-off processes. HEADWAY EC 102 photoresist tool is designed to provide high through-put for production lines. Its low-temperature baking requirement allows for faster substrate integration and pre-coat processing, shortening cycle time. Additionally, its compatibility with a variety of standard processing equipment, such as wafer cleaners, dryers and exposure systems, ensures high performance at low cost. Furthermore, EC 102 photoresist asset is highly reliable. It is characterized by high thermal, hydrolytic and oxidative stability, allowing it to be used in a wide range of processing temperatures and environments. The photoresist model is also easy to use; its robust formulation makes it suitable for any temperature, humidity and exposure conditions. In summary, HEADWAY EC 102 is a single-coating, negative photoresist equipment designed to provide excellent resolution, line edge roughness (LER) and line-width control. Its low-temperature baking, high etching selectivity, long-term stability and compatibility with a variety of standard processing equipment make it an ideal choice for microlithography optical printing applications.