Used HEADWAY LSC 510 #123052 for sale

HEADWAY LSC 510
Manufacturer
HEADWAY
Model
LSC 510
ID: 123052
Photoresist coater 22" Diameter chamber Large substrates: 50-6,000 rpm Safety enclosure (6) Speeds (14) Timers.
HEADWAY LSC 510 is a commercial photoresist equipment designed for the lithography process for prototype development and production. The system consists of two main components - the delivery unit and the lithography unit - and is powered by three Laser Scanning Controllers (LSCs). The delivery unit houses the laser diode unit, which provides the energy for the photoresist process. The transfer of a desired pattern onto a wafer begins with the photomask pattern. Polymethyl methacrylate (PMMA) is applied to the front surface of the mask, followed by a layer of chromium platinum or another metal. The mask is then placed over the substrate and exposed to the UV radiation from the laser diode. This initiates a change in the initially photoresist-covered substrate, exposing only the areas which the laser diode was able to reach. The transfer of the photomask pattern to the substrate is achieved through the lithography unit. This unit contains three components - an exposure stage, a scanning unit, and the beam generator. The exposure stage contains a high-precision motorized x-y stage which holds the wafer, as well as a tilt machine to control the angle of the wafer during the exposure. The scanning tool moves the laser diode back and forth in defined directions over the photomask. The beam generator is responsible for the laser and the intensity of the laser diode. The lithography unit is controlled by three Laser Scanning Controllers (LSCs), which provide the positional accuracy and computer control that is necessary for a successful photoresist process. They control the high-precision coordinates of the laser, monitoring the photomask pattern and positioning the laser diode with the required accuracy. LSC 510 is ideal for rapid prototyping and mass production. Its accuracy and compact design make it suitable for many types of environments and processes. It is a reliable and cost-effective solution for lithography projects and provides precise results.
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