Used HEADWAY MC 75 #77378 for sale

HEADWAY MC 75 is a photoresist equipment for the fabrication of microelectronic circuit boards. It is designed for the production of high-accuracy components and is perfect for use in a variety of microelectronic applications. The photoresist system combines the advantages of a multi-component chemistry unit, an ultra-accurate resist layer, and a low-viscosity coating. This combination makes MC 75 systems optimal for production and development of components that require dimensional stability and repeatability. Using this photoresist machine, the substrate can be covered with a light-sensitive liquid resist which is then exposed to ultraviolet light. This causes the liquid resist to harden, forming a hardened resist mask which can then be washed or etched away. The ultra-accurate resist layer has a minimum linewidth accuracy of 75µm. This reduces the drag on and friction between patterned layers, providing a uniform and consistent pattern across the entire substrate. Additionally, the low-viscosity coating can significantly reduce dust buildup and contamination. In order to ensure high yields and quality, the photoresist tool is manufactured under the stringent guidelines of ISO 9001 and SEL approved by the Semiconductor Equipment and Materials International (SEMI) organization. These standards ensure robust and reliable components. Finally, this photoresist asset is an ideal solution for the production of ICs, flat panel displays, optoelectronic devices, MEMS, and other small components. It also provides a cost-effective alternative for large substrates such as wafers and flexible boards. Overall, HEADWAY MC 75 photoresist model is an advanced and precise solution for producing precise components. It combines multi-component chemistry, ultra-accurate resist layer, and low-viscosity coating for performance and repeatability. This makes it suitable for a wide variety of microelectronic applications.