Used HEADWAY PWM32-PS-R790 #9113178 for sale

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HEADWAY PWM32-PS-R790
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Manufacturer
HEADWAY
Model
PWM32-PS-R790
ID: 9113178
Spin coaters.
HEADWAY PWM32-PS-R790 is an enhanced photoresist system designed to provide a superior coating process for a wide variety of substrates. It uses a two-dimensional array of LEDs to create a uniform layer of photoresist on the substrate. The LEDs generate high-intensity white light to pattern the photoresist material, and the precision accuracy of the array ensures superior substrate coverage. PWM32-PS-R790 photoresist system features a controllable pulse width modulation (PWM) drive to enable precise patterning of the photoresist material. The combination of precise drive and high-intensity light provides superior coverage with minimal collateral damage to the substrate. The improved patterning capabilities enable close-spaced patterns, precise line width control, and the elimination of over-exposure or underexposure of the substrate. HEADWAY PWM32-PS-R790 also includes a high-resolution image-capture camera to validate the photoresist pattern. The camera accurately captures images of the patterned photoresist, allowing for detailed validation and review of the photoresist layer prior to optimization. The camera also has various image-processing functionality to optimize the patterning of the photoresist layer. In addition to its superior patterning capabilities, PWM32-PS-R790 also utilizes proprietary chemical solutions and processing techniques to ensure maximum performance of the photoresist layer. Techniques such as high-sensitivity etching and chemical adhesion support the uniform coverage of the substrate and the consistent quality of the photoresist layer. Overall, HEADWAY PWM32-PS-R790 photoresist system offers a comprehensive solution to improve substrate coverage and enable precision patterning. The intensity of the LED array, the controllable pulse width modulation drive, and the high-resolution image-capture camera all enable superior performance of the photoresist layer with minimal collateral damage to the substrate. The precision patterning and chemical processing solutions enable high-quality results, ensuring optimal performance of the photoresist layer.
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