Used HITACHI MA-Ni02 #293662279 for sale

HITACHI MA-Ni02 is a photoresist system that is used in the manufacturing of integrated circuits (ICs). This system utilizes a variety of techniques to achieve the desired results of an IC. These techniques include: exposure of a photoresist layer to ultraviolet (UV) radiation, etching, lamination, and sputtering. UV radiation is applied to the photoresist layer, which is used to expose the desired pattern onto the silicon wafer. The photoresist is sensitive to particular wavelengths and will become insoluble after being exposed to the radiation. After the pattern is exposed, the etching process begins. This involves the removal of unwanted material and shaping the patterned area in order to create an integrated circuit. Lamination of the photoresist layer involves the use of thin film which is then laid over the exposed and etched material. Lamination helps to protect the IC from damage and to prevent any further changes to the patterned area. Sputtering is the process of spraying a thin layer of nitride particles onto the wafer. These particles abide to the patterned area, creating an additional layer of insulation. This process is completed to prevent any short circuits from occurring on the IC. Overall, MA-Ni02 photoresist system is used to create an integrated circuit by exposing a photoresist layer to UV radiation, etching the patterned area, laminating the layer, and sputtering a thin layer of nitride particles. These steps create a desired pattern that can be used to create an integrated circuit.