Used HONGSU BOE #9328964 for sale

Manufacturer
HONGSU
Model
BOE
ID: 9328964
Wafer Size: 5"
Photoresist removal system, 5" DI Water: Average flow LPM: 90 Maximum pressure: 2.5 kg/cm² Temperature: RT Resistance Ω: >18 Caliber inch: 11/2" Gases: CDA: Maximum pressure: 7 kg/cm² Minimum flow: 400 Pipe: SUS316 Connector: SWAG Caliber inch: 1/2" N2: Maximum pressure: 7 kg/cm² Minimum flow: 200 Pipe: SUS316 Connector: SWAG Caliber inch: 3/8" Filter: 1um H2SO4: Maximum flow: 5 PFA Pipe Flare connector Caliber: 1/2" H2O2: Maximum flow: 5 PFA Pipe Flare connector Caliber: 1/2" Acid exhaust: Maximum pumping volume CFM: 450 PP Pipe Flange connector Caliber inch: 8" Power supply: Single-phase, 220 V 3-wire, 210 A, 46.2 kVA.
HONGSU BOE is a photoresist equipment that is used in the production of high-precision microelectronic devices. The system is a spin-on photoresist material with a built-in protective coating, which provides reliability and stability in a freeform microelectronic environment. It is designed to specifically meet the requirements of modern device design. The photoresist material is spin-coated onto the substrate of the microelectronic device. Then, the sensitive material is exposed to UV light, which selectively changes the properties of the exposed material. Once the desired pattern has been created, the excess, uncured photoresist is then removed. This can be done by either plasma-etching, wet-chemical etching, or laser machining. BOE is a completely developed unit that can be tailored to all aspects of the photoresist process, including, but not limited to, process steps of developing, etching, and finally curing, using dry film and/or wet film technology. The resulting device is resistant to moisture and environmental contamination that can lead to degradation in photoresist devices. This is a result of the protective coating present on HONGSU BOE machine. BOE tool offers advantages over other systems, particularly because it allows for much greater stability and reliability. The photoresist material is designed to remain stable and maintain its integrity during fabrication, resulting in fewer defects and better reliability for the device. Additionally, the asset enables a high degree of precision in the photolithography process due to its aligned photosensitive layer and focused light source. This ensures that the device is able to provide consistent results every time. Finally, HONGSU BOE model utilizes advanced tools and techniques, ensuring that the microelectronic device produced is of the highest quality. The equipment such as the rotating wafer stage, vacuum equipment, and monitor are all tuned to the photoresist system's requirements, allowing for the efficient and accurate performance of the photolithography process. This allows for customized, reliable processes for any given application, and helps to simplify the manufacturing process. In conclusion, BOE is a comprehensive photoresist unit that offers reliable and consistent results. It is designed specifically for microelectronic devices, and features a precision-driving machine and protective coating. This tool also provides high levels of stability and accuracy, and is easy to use and maintain. Overall, HONGSU BOE is an ideal photoresist asset for complex, high-precision device design.
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