Used HONJIG HJ-W201 #9153419 for sale

HONJIG HJ-W201
Manufacturer
HONJIG
Model
HJ-W201
ID: 9153419
Vintage: 2010
Lift gold machine 2010 vintage.
HONJIG HJ-W201 Photoresist Equipment is suited for developing and pressure testing a wide range of photoresists. The system provides an array of features that make the development of new photoresist products simpler, more accurate, and more versatile. The unit includes advanced lithographic tools for facilitating repeatable, reliable photoresist development. These include an adjustable advanced ArF laser with low background swell and a dual-wavelength advanced ArF scanner. These components ensure precision development of photoresists that account for the effect of wavelength in layout decisions. Additionally, the machine comes with a temperature-controlled photofinish chamber that improves performance across a wide variety of photoresist products. This tool also includes non-contact metrology equipment to inspect the quality of lithography, namely a video-style microscope that achieves high resolution imaging for small features, and a confocal microscope for high resolution image capture. The asset also offers a variety of data output options including 20Gbps Ethernet, USB 3.0, and FireWire. The model offers users a comprehensive set of analytics and visual tools to monitor and track photoresist development. There are spectrometry-mode and processing-mode displays available to provide real-time feedback on development results. Additionally, tracking of production runs and the generation of history-logging graphs give greater insight into developing trends. The equipment also features high-speed servo control, which ensures stability of layout over a range of temperatures, improving overall system repeatability. HJ-W201 Photoresist Unit is an early-stage solution designed to give laboratory-level performance with low capital investment. It offers users reliable, repeatable photoresist development and a comprehensive suite of analytic tools to monitor results. Further, its advanced lithographic tools and advanced ArF laser make it well-suited for wide-scale photoresist development. This machine is designed to maximize efficiency and repeatability while producing quality photoresist products.
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