Used HONJIG HJ-W201 #9172387 for sale

HONJIG HJ-W201 photoresist equipment is a high performance and fully featured solution for a range of photolithography processes. It is suitable for manufacturing fine features on semiconductors, printed circuit boards, and electronic components. This system combines a powerful laser source, an advanced optical imaging unit, and a precision alignment stage to enable the accurate and repeatable exposures needed for the production of small, complex features. It is capable of performing continuous etch and non-continuous exposures, making it suitable for patterning an unlimited range of complex shapes and photolithographic structures. The core component of this machine is a high-power laser source, allowing for the generation of very precise exposures. It is capable of generating high-intensity, high-resolution laser scans, while also providing flexibility to adjust to the needs of a given fabrication process. The laser's pulse width, power output, and frequency can all be adjusted, allowing for a wide range of exposure requirements. The tool also features a sophisticated optical imaging asset, including a large field of view (FOV) and an adjustable focus mechanism. This allows for high-resolution imaging of the exposed photoresist material. The imaging model is integrated with a sophisticated alignment stage, allowing accurate and repeatable positioning of the photomask and substrate materials. The equipment includes a comprehensive and user-friendly software interface for programming and controlling the exposure process. It is capable of controlling the laser power, frequency, pulse width, duration, and number of passes. The software also features an automated feedback loop, allowing for precise control over the exposed photoresist material. Finally, the system includes a range of safety features, including a UV filter on the laser, a light curtain to protect from accidental exposure, and an emergency off switch for immediate shutdown in case of an emergency. In conclusion, HJ-W201 photoresist unit is a powerful, fully-featured solution for photolithography and patterning processes. It features a powerful laser source, advanced optical imaging, and precision alignment stage, allowing precise and repeatable exposures for the fabrication of fine and complex features. The machine also includes comprehensive, user-friendly software interface and a range of safety features.