Used INTELLIGENT MICRO PATTERNING SF-100 Xpress #9224122 for sale

INTELLIGENT MICRO PATTERNING SF-100 Xpress
ID: 9224122
Maskless lithography system Mercury arc lamp: Energies g-, h-, and i-line 6 Position filter wheel for choosing wavelength spectra Field-proven optical design: Integrated with patented smart filter technology Auto-focusing: Integrated CCD camera for in-line substrate viewing Standard optical functions Automated XYZ stage: 1-Button operation and auto stitching Labwindows™ based vision developers module Rapid prototyping.
INTELLIGENT MICRO PATTERNING SF-100 Xpress is a state-of-the-art photoresist equipment designed for high-precision lithography and other advanced patterning applications. This system is designed for use in demanding production environments and yields exceptional resolution and measurable results. SF-100 Xpress specializes in high-resolution imaging and a wide range of feature sizes, making it perfect for fine detail, high-volume lithography. INTELLIGENT MICRO PATTERNING SF-100 Xpress utilizes the latest developments in photoresist processing technology, such as optimized light exposure and higher-end developer process control, as well as automated processes that provide greater speed and accuracy. The unit is designed to be user friendly and includes easy-to-use calibration software that can be adjusted to meet user requirements and operating conditions. The machine also includes a full set of process tools to ensure the highest possible throughput and effectiveness for even the most demanding processes. The tool utilizes a sophisticated imaging asset to generate precision patterns with a wide range of feature sizes and overhangs. The advanced model can produce patterns with a top feature size of 100 cm-1 and bottom feature sizes of 1.5 cm-1, both with high accuracy and uniformity. The equipment is designed to provide results with minimal exposure, and it can be set up to produce several layers without adjusting the user settings. The system is designed to run smoothly and quickly, and it offers users a choice of resolutions that maximize throughput. SF-100 Xpress can be used to process a wide range of photoresist materials, including polyimide-based photoresists, silicon-based photoresists, plastomum-based photoresists, and other materials that require advanced lithography processes. INTELLIGENT MICRO PATTERNING SF-100 Xpress can also be easily configured to support additive and layered patterning processes. Despite its advanced features, SF-100 Xpress has been designed to be both accessible and cost-effective. Its dedication to high-quality imaging helps ensure that users receive results that are accurate, consistent, and cost-effective. In the end, this unit is the perfect combination of strength and speed, providing users with precision patterning and cost-effective, efficient results.
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