Used INTELLIGENT MICRO PATTERNING SF-100 #9390791 for sale

ID: 9390791
Vintage: 2009
Maskless lithography system Maximum size of substrates: 200 mm x 200 mm Wavelength: 365-578 nm Mercury lamp: 200 W (Resource of work 1000 hours) Minimum element size: Up to 1 µm Grayscale exposure: 768 Levels Vision system: CCD Camera Control: Standard PC, User interface Data format: BMP, DXF Automatic focusing Semi-automatic combination Optics: Standard optics, high resolution optics Backing plate XY-Axis travel: Accuracy: ±200 nm Repeatability: ±50 nm Z-Axis travel: Total travel: 25 mm Accuracy: ±200 nm Repeatability: ±75 nm Theta movement: Rotation: 360° Accuracy: ±5 arc sec Repeatability: ±2 arc sec Vibration protection: Anti-vibration base Vacuum: -0.6 bar Pneumatic supply: 5-6 bar, 0.5 m³/h Power supply: 200 V, 50-60 Hz, 7 kW (Maximum) 2009 vintage.
INTELLIGENT MICRO PATTERNING SF-100 INTELLIGENT MICRO PATTERNING Equipment is a state-of-the-art photoresist system that is used in applications such as semiconductor device fabrication and micro-fabrication. It utilizes sophisticated machine vision technology to provide high accuracy and precision for the micro-patterning of products. SF-100 unit uses a unique double exposure technique and a well-defined light source to achieve excellent feature resolution and uniformity. INTELLIGENT MICRO PATTERNING SF-100 has high-precision optical positioning systems that enable it to accurately align the photoresist layer with the device substrate. It also features an automated exposure and develop module that ensures that the photoresist is adequately exposed. This module can also support high- and medium-resolution patterning which ensures that any possible defects due to improper exposure are minimized. SF-100 also has sophisticated process control systems which enable the photoresist layer to be uniformed and properly developed. This is essential for achieving highly accurate patterns. The machine also includes a laser Writehead which uses lasers of different wavelengths to write patterns directly onto the photoresist. The tool is equipped with a high-resolution optical imaging asset, which can be determined by the user. It can be used to facilitate fine patterning with features smaller than 5 um. This model can be used for lithography jobs that involve finer details, like trenches, grooves, or pits. INTELLIGENT MICRO PATTERNING SF-100 INTELLIGENT MICRO PATTERNING Equipment offers maximum flexibility in terms of printing and development. It has both a batch and continuous mode operation to better accommodate highly complex jobs. It also has a range of compatible coatings and photoresist materials to suit different device applications. SF-100 system is easy to operate with its intuitive graphical user interface. It allows its users to quickly and accurately adjust unit parameters. It also includes multiple safety systems to ensure that the photoresist and device substrates are kept in a pristine condition throughout the entire process. INTELLIGENT MICRO PATTERNING SF-100 INTELLIGENT MICRO PATTERNING Machine is an invaluable tool for fabricating high-quality, ultra-precise micro-patterns. It has the capability to produce tight feature patterns for a wide range of applications, from semiconductor device fabrication to micromachining. With its reliable operation and precise results, SF-100 is perfect for achieving highest device accuracy and reproducibility.
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