Used IZOVAC AOC-M #9249484 for sale

IZOVAC AOC-M
Manufacturer
IZOVAC
Model
AOC-M
ID: 9249484
Optical coater Type: PECVD Drum.
IZOVAC AOC-M is a high quality photo resist system designed specifically for the selective etching of microelectronic materials. It is the industry standard for microcircuit fabrication and is suitable for a wide range of processes such as wet etching, lift-off, chemical etching, vapor etching, and sputtering. The system utilizes a unique light-sensitive organic compound which serves as both the photoresist and etch mask. This combination allows for precise and uniform patterning and etching while preventing undesirable residues from forming on the wafer surface. AOC-M consists of two components: the photo resists and the etch masks. The photo resists are applied to the substrate before exposure to a specific wavelength of radiation. The radiation causes the photo resists to harden, becoming a dry film. This dry film acts as the mask which prevents the etch from accessing the unprotected areas of the substrate. The etch masks are applied following the photo resist layer. These are typically composed of an organic compound which reacts to the etch solution, protecting the substrate from adverse etch effects. In some cases, the etch masks can also promote the etching process, reducing cycle time and increasing throughput. Once the photoresist and etch masks are in place, the mask/substrate can be subjected to the specific etch conditions. The etchant will react with the unprotected areas of the substrate, while the photoresist and etch mask will protect the desired regions. This lattice-like pattern of etch and mask results in a patterned circuit layer. The combination of photoresist and etch mask makes IZOVAC AOC-M an ideal choice for a variety of microelectronic fabrication tasks including patterning, selective etching, and process control. The system provides a high level of accuracy and reproducibility, and is well-suited for device-level or component-level processes. Furthermore, the robustness of AOC-M makes it suitable for a wide range of etch chemistries. Ultimately, IZOVAC AOC-M provides the exacting technology needed for modern microelectronic fabrication.
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