Used IZOVAC Aurora G5 #9395190 for sale
URL successfully copied!
ID: 9395190
Single side metal coater
Type: Vertical
Coating method: Sputter
Substrate: GaAs Wafer, (80) Substrates / Carriage
(2) Carriages
Membrane: (6) Metal layers
Tact time: 336 sec
Carrier moving speed: 0.245 m/min
Cathode distance: ≥1000 mm
Coating thickness: 120 mm ≤±5%
Auto loading / Unloading (Portal type robot, TBD)
Substrate uncoated area: <2 mm
RGA PC, protection valve, ports
Substrate size: Square with rounded edges
Maximum: 108.5 mm x 108.5±0.5 mm
Minimum: 106 mm x 106 mm
Corner radius: 4.5±0.5 mm
Edge exclusion: 2 mm around
Thickness range: 0.55 mm - 0.65 mm
Substrate coating area: 102 mm x 102 mm
Acceptable temperature: ≤250°C
Etching:
Ion beam source (Linear)
Remove 10 A - 50 A ≤±5% across each pallet
Magnetrons:
DC Planar magnetrons (MSS)
(11) DC Rotary magnetrons (CMSS)
Pumps:
Dry mechanical pumps
Turbo molecular pumps
Cryogenic pumps.
IZOVAC Aurora G5 is a state-of-the-art photoresist equipment designed to deliver reliable, precise results in a variety of microscopic applications. Photoresist systems are used to create highly precise, microscopic structures on a variety of surfaces, including glass, silicon, and other materials. The improved design of Aurora G5 system allows for a greater precision than standard photoresist systems. The unit is capable of producing features that have sharp corners, and the angles of the features produced can be accurately controlled to within minutes of arc. The feature size range of IZOVAC Aurora G5 can be adjusted from one micron up to 40 microns. With its advanced software package, it can produce patterns with complex shapes, such as circles, spirals, and stars, even in three dimensions. Aurora G5 machine is highly automated, allowing for efficient, unattended production. The pre-programmable tool produces highly detailed and repeatable patterns, and features such as anti-glare protection and beam monitor calibration ensure that the photomask remains stable and the light delivered is as expected. The G5 asset also has an improved UV source that is both brighter and precise. This allows for faster and more accurate exposure of the photoresist, making it possible to create micron-scale patterns in a manner that would be impossible with conventional photoresist systems. The UV exposure source can be adjusted to produce an even more uniform coverage, enabling even more intricate features to be developed. IZOVAC Aurora G5 is also equipped with an advanced imaging model. This allows for rapid inspection and evaluation of the features created by the photoresist. Overall, Aurora G5 photoresist equipment is optimized for speed and precision, and it is highly automated and user-friendly. It provides precise, repeatable results for a variety of microscopic applications, and is a reliable tool for creating intricate patterns with sharp corners and high feature density.
There are no reviews yet