Used IZOVAC Heliosiz #9395189 for sale
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ID: 9395189
PEVCD Coater
Type: Lying down
Substrate: Silicon wafer
Membrane: a-Si:H, doped a-Si:H, SixNy:H
Substrate size: 156.75 mm x 156.75±0.25 mm
Deposition rates: 0.1 - 5 nm/sec
Coating technology: (2) CCPs
Double sided coating
Coating thickness: ≤±3% (Single layer)
Dry mechanical pumps
Process temperature: Up to 250°C
Manual loading / Unloading
Acceptance test: TBD
Chamber pressure:
Ultimate pressure: 1.1 Pa
Working pressure: 100 Pa - 1000 Pa.
IZOVAC Heliosiz is an advanced photoresist equipment designed to deliver extremely precise, consistent and repeatable microcoating results. It provides a tightly controlled process that increases the accuracy and reproducibility of complex coatings on a variety of substrates. The system combines fully automated control of all coating parameters with integrated metrology, allowing for rapid process feedback and optimization. The process begins with the formation of a resist layer on the substrate using electron beam (EB) or deep-UV (DUV) light exposure. The exposed resist layer is then developed using a buffered aqueous development solution to reveal the desired surface pattern. A range of post expose baking and post development baking options ensure optimum film formation. The automated software control unit allows for substrate heating, exposure, and processing parameters to be easily adjusted. It also provides excellent data integrity and traceability throughout the process. To ensure uniformity between batches, the machine includes auto-sampling and automated tuning of all process parameters. Heliosiz uses a specialized lumen line technology for precise positioning of the exposure head in order to reduce the possibility of overlaps in resist layers. The exact exposure and exposure times can be modified to account for a variety of challenges such as high levels of dust contamination. It also offers post exposure baking, when needed, to prevent overexposure of more delicate resist layers. IZOVAC Heliosiz uses a specialized dye-coating feature to provide a variety of coatings to the device. This feature can be used to protect delicate features, enhance adhesion of resist materials, and facilitate the deposition of sensitive active materials. The ultimate performance of any coating performed by the tool can be evaluated with appropriate metrology tools. Heliosiz is a versatile, powerful and precise photoresist asset that provides highly repeatable coating results for a wide range of substrates. Automated process control and process optimization allows for tight control over all process parameters, and metrology allows for a rapid adjustment to the feedback of the model. This provides the basis for a consistent process that has been proven in the production environment.
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