Used JAS JAS-591TM #9360825 for sale

JAS JAS-591TM Photoresist Equipment is a specialized instrument designed for the development and characterization of photoresist materials used in the industrial production of wafer-level fabrication. The system is centered around a high-speed robotic arm unit, which allows for the precise application of various photoresist materials to a substrate wafer surface. This arm is set up with a highly accurate stage assembly and a micro-positioning platform which can be controlled and adjusted in all three dimensions. In addition to the robotic arm, JAS-591TM also consists of a number of other components including a beam generator, a high intensity laser, electrodes, and a vacuum source. The beam generator works in tandem with the laser and electrodes to etch out predetermined patterns on the substrate wafer. The laser is adjustable in intensity, allowing for precise control over the development of photoresist. The vacuum source, meanwhile, is used to provide a constant, low-pressure environment in the chamber during photo resist development. The machine also comes with a number of diagnostic and display instruments, including a temperature monitor, an oscilloscope, a heater, and various other sensors. The temperature monitor ensures that photoresist material maintain optimal viscosity during the development process, while the oscilloscope measures and displays an image of the photoresist patterns as they are created on the substrate wafer. The heater, meanwhile, keeps the chamber at an even temperature throughout the photoresist development process. Finally, the tool utilizes a digital interface to allow for both simple and complex control over the photoresist development process. This interface allows users to select various parameters such as laser power, pattern size, and layer thickness. These parameters can be individually adjusted in order to create intricate photoresist patterns with great precision and control. In short, JAS JAS-591TM Photoresist Asset is an invaluable tool for the industrial production of wafer-level fabrication materials. The model's combination of high-precision robotic arm, adjustable laser, and digital interface ensure that photoresist patterns can be developed with great precision and accuracy. Together, these components make it an extremely versatile and effective tool in the creation of integrated circuits and other micro-fabrication processes.