Used KAIJO 1030/1108 #9149824 for sale

KAIJO 1030/1108
Manufacturer
KAIJO
Model
1030/1108
ID: 9149824
Wafer Size: 8"
Wet bench, 8".
KAIJO 1030/1108 is a photoresist equipment developed by the Japanese materials company KAIJO. Photoresist systems are used in the manufacture of microelectronic components and equipment, for sensitizing surfaces to light prior to chemical and etching processes. KAIJO 1030/1108 is a liquid concentrated photoresist system with four components; alkaline (base) concentrate, acid (activator) concentrate, a total of three resist films and a developer for use with the resist films in the etching process. KAIJO 1030/1108 is a stand-alone solution that can be used in a variety of resist processes, including chrome plating and dry-etching. The alkaline concentrate acts as the base for the resist, while the acid concentrate is the activator or sensitizer. The combined concentrate must be finely dissolved, activated, and then applied to the substrate for a required resist. This unit of resist is particularly useful for use on thin material, as the liquid concentrate is easily absorbed into the substrate, offering superior sensitivity. KAIJO 1030/1108 also has a high resistance to organic solvents, allowing it to be used in a wider range of process types. The resist films must be carefully matched to the substrate and resist type, with the three resist films providing flexibility and allowing for optimized etching results. The developer is then used to dissolve the remaining resist film after etching. KAIJO 1030/1108 is an extremely versatile, high-performance photoresist machine, and suited for a wide range of etching processes. It provides superior uniformity of resist coverage, with a long shelf-life and easy application. The concentrate is forced to a controlled thickness and can be easily applied, ensuring uniform results with little to no waste.
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