Used KARL SUSS / MICROTEC ACS 200 Gen3 #293819423 for sale
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ID: 293819423
Vintage: 2019
(2) Coater / (2) Developer system
Hot plate
High temperature plate
Cold plate
2019 vintage.
KARL SUSS / MICROTEC ACS 200 Gen3 is a photoresist equipment that has advanced automated lithography capabilities for process optimization and greater flexibility. This system allows for automated and precise alignment and exposure alignments of photoresist materials for the fabrication of semiconductor devices. This unit is designed to provide for very accurate optical development and alignment capabilities with eight-axis precision. The automated control can be integrated for processes like exposure and development that can reduce the need for manual inputs. Additional features like an auto-leveling option with image stitching help to optimize the reproducibility of nanoscale patterns. MICROTEC ACS 200 Gen3 has a built-in wafer loader that can hold up to four 300mm wafers, allowing for multi-batch processing. Wafer handling is improved with dual-beam optics, which helps to reduce burn marks during exposure. It also has a programmable UV exposure time that can be adjusted depending on the complexity of the pattern being developed. The exposure alignment engine for this machine is quite advanced compared to other similar systems. This includes a 3-axis wafer stage with an adjustable laser tool for automated alignment. It also features an auto-tuning alignment algorithm and active feature recognition technology to optimize alignment and reduce processing time. The integrated user interface for this asset is quite intuitive and user friendly. It features a simplified graphical user interface along with a flexible workflow engine that enables the operator to program the model to their own custom settings. KARL SUSS ACS 200 Gen3 has the ability to operate in a standalone capacity or be integrated into a cluster environment. This is a valuable feature for enabling customers to easily deploy this equipment into a single or multiple system environment. In a multi-unit environment, users can easily transfer patterns across systems while taking advantage of increased scalability, further enhancing the development of complex nanoscale structures. In summary, ACS 200 Gen3 is an advanced photoresist machine that has ample features and capabilities to improve process optimization and enable accurate alignment and exposure for nanoscale pattern fabrication. The tool has a number of attractive features such as an automated asset with an intuitive user interface, a multi-axis exposure alignment engine, a programmable UV exposure time, and the ability to be integrated into a standalone or multiple model environment.
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