Used KARL SUSS / MICROTEC ACS 200 #9178787 for sale

KARL SUSS / MICROTEC ACS 200 is a state-of-the-art photoresist equipment designed for high-precision lithography applications. This sophisticated system utilizes advanced alignment techniques and automated processes to ensure accurate placement and production of patterned photoresists and other materials. Through advanced, high-resolution imaging capabilities and superior control of the imaging unit, MICROTEC ACS200 is capable of producing high-quality, repeatable results with minimal operator error. To begin, KARL SUSS ACS-200 utilizes a highly precise and automated alignment machine that ensures accurate sample positioning. Through the combination of manually adjusted sample alignment aids and automated processes, the tool is capable of achieving sub micron alignment accuracy. This allows the user to accurately place and pattern photoresist, thin films, and other required materials. ACS 200 also has a superior patterning asset, allowing for the patterning of small features with repeatable precision. To provide an accurate view of the desired pattern, this model utilizes advanced optical imaging, as well as digital imaging. Not only can this equipment produce standard features, but is also capable of producing complex, high-aspect-ratio features as well. KARL SUSS / MICROTEC ACS200 is one of the most sophisticated photoresist systems available, thanks to its numerous unique features. One such feature is its advanced thermal management capabilities, which enable precise temperature control when exposing the materials to various temperatures. This system also has easy-to-use, intuitive software that allows users to control numerous aspects of the imaging and patterning processes. Additionally, the unit is capable of producing very high resolution patterns with a minimum spot size of 25 nanometers thanks to its specialized photomask alignment machine. In conclusion, ACS-200 is a highly advanced photoresist tool designed to produce highly precise, accurately patterned photoresists and thin films. Its superior alignment, imaging, and patterning capabilities enable the user to achieve sub micron accuracy, as well as highly complex, high-aspect-ratio features, with ease. This sophisticated asset also has intuitive, user-friendly software and thermal management capabilities, allowing for the production of very high resolution patterns with minimal operator error.