Used KARL SUSS / MICROTEC ACS 300 Gen2 #9356898 for sale

KARL SUSS / MICROTEC ACS 300 Gen2 is a photoresist equipment for UV or electron beam lithography. It is a full-featured system that is designed to give high precision, high speed, and repeatable results. The unit is equipped with a number of different technologies, allowing it to deliver superior performance at all stages of the lithography process. At the heart of the machine is its precision xy-stage. This is a sophisticated tool that ensures that the substrate is always held securely in place during the entire lithographic process. The precision xy-stage has an angular resolution of 1µm, making it capable of producing aligned patterns with nanometer-scale accuracy. The stage is also equipped with a motorized vacuum asset that ensures that the substrate is firmly held against the stage during lithography, giving superior performance for chemical processes. The model is also equipped with a variety of imaging optics. This allows for even distribution of illumination during the exposure process and ensures that a consistent and reproducible patterning process is achieved. The equipment also has an adjustable shutter which can be used to restrict the entrance of stray light during exposure, ensuring a precise lithographic process and reducing edge effects. The system is capable of working with a variety of chemical resists, including both negative-acting and positive-acting ones. By employing a variable energy dose, the resist can be accurately and reliably exposed to the desired levels. The unit also has a built-in dry cleaning technology that significantly reduces post-lithography cleaning time. MICROTEC ACS 300 Gen2 photoresist machine is designed to provide high-precision lithography with excellent repeatability. Its precision xy-stage, adjustable optics, and variable energy dose features make it ideal for nanometer-scale lithography. Its built-in dry cleaning technology ensures that post-lithography cleaning is minimized, while its wide compatibility with different chemical resists makes it suitable for a variety of applications.