Used KARL SUSS / MICROTEC ACS 300 #293637223 for sale

KARL SUSS / MICROTEC ACS 300 Photoresists Equipment is a powerful and reliable photolithography tool used to produce high-density integrated circuits (IC). This system can be used to produce ICs with submicron structures. It offers the highest process accuracy and yields in the industry. At the core of the unit's operation is a UV laser whose output is split into three beams. The first beam is used to expose the aerial image of the IC onto the resists. The second beam is used to focus the image with a variable focus lens. Finally, a third beam of light is used to control the altitude and heating functions of the platform. The advanced optics utilized within the machine are highly precise, allowing for accurate lithographic processing. This includes the ability to expose advanced dense photoresist layers with high resolution, down to the 0.5 μm range. Additionally, MICROTEC ACS 300 is capable of exposing a variety of different lithography protocols, including time-based, dispense and spin-based processes. A number of features contribute to the excellent performance of the tool. It has a large PCB size (400 mm x 350 mm) that allows for patterning utilizing the exposed pattern of a printed circuit board. In addition, the precision positioning of the Z-Axis on the asset allows for accurate vertical control of the exposure process. KARL SUSS ACS 300 model is equipped with a powerful microprocessor-driven image engine that allows for memory storage and recall of parameters, thus simplifying the photoresists process. Also, the user can set up a grid pattern to enable easy editing of images, thus minimizing the time spent on patterning. Finally, this equipment is extremely reliable, with an MTBF (Mean Time Between Failures) of over 82,000 work hours. This ensures that users can trust and rely on the system for their photolithography needs. Overall, ACS 300 Photoresists Unit is an excellent tool for the production of ICs with submicron features. It features excellent optics, high process accuracy, reliable performance, and a powerful image engine.