Used KARL SUSS / MICROTEC ACS 300 #9081962 for sale

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ID: 9081962
Wafer Size: 8"-12"
Vintage: 2003
(4) Developer track system , 8"-12" (2) 12" loadports 8" loadport Robot (4) Developer chambers Chamber robot (4) Chillers 2003 vintage.
KARL SUSS / MICROTEC ACS 300 is a photoresist equipment, designed for the precise and consistent patterning of substrates using photolithography. This system, in particular, specializes in high-end wafer patterning. MICROTEC ACS 300 unit includes an OptiCAL exposure head which is a highly advanced machine that can expose substrates up to 200 mm and semiconductor wafers up to 8". This exposure head features a SUSS Greentec reduction optics to ensure a high resolution image is produced. Furthermore, it is equipped with a scanning lens and a laser autofocus device to assure accuracy and precision when imaging substrates. KARL SUSS ACS 300 also comes with an AutoEdge aligner in order to properly align the light pattern onto the substrate. This aligner helps to ensure that the light is appropriately focused on the desired area. It achieves this via a scanning electron microscope (SEM) which is used to detect minute misalignments of the substrate. The tool can be used for both contact and projection photolithography. This type of photolithography makes use of a light source such as a laser, which is shone onto a light-sensitive material. This exposes areas of the substrate to create a pattern. This same process can be used to etch, lithograph, and pattern substrates. Finally, ACS 300 photoresist asset features a unique automated cleaning model. This equipment helps to reduce human error, maintain lens quality, and keeps the system running in optimal condition. This is done by atomically cleaning and coating the lens with a special liquid every few hours. This maintains the resolution and accuracy of the unit while preventing any degradation due to wear and tear. In conclusion, KARL SUSS / MICROTEC ACS 300 is a highly advanced photoresist machine that offers precise and consistent patterning of substrates. Its features also allow for contact and projection photolithography. Its automated cleaning tool helps to maintain the accuracy and resolution of the asset.
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