Used KARL SUSS / MICROTEC ACS 300+ #9144010 for sale

KARL SUSS / MICROTEC ACS 300+ photoresist equipment is a precision machine used for photolithography. It is equipped with a state-of-the-art micro-stepping motor and allows for the accurate and repeatable exposure of photoresist. The system utilizes either manual or computer-controlled operation, making it ideal for both production and research applications. MICROTEC ACS 300+ photoresist unit has a large, adjustable work surface that can handle substrates up to 200 x 400 mm in size. The machine is equipped with a user-friendly LCD displays, which includes all relevant information about the process, such as the beam size, time, and the resist settings. The beam diameter is adjustable from 6 µm to 650 µm, and a zoom port allows for a variety of different resist patterns to be created. The beam size can be quickly and accurately adjusted for precision alignment. KARL SUSS ACS 300+ utilizes Scott Hardman's patented stain-glass reflector technology. This allows for uniform exposure across the substrate with minimal distortion. The tool is outfitted with a UV-A reflector and an adjustable Shadow Hawk collimator. This makes the asset extremely accurate and reliable during the exposure process. The model is also equipped with an in-process control (IPC) illumination, which allows for exposure correction after the master pattern has been formed. A wide range of photomasks, phototools, and resist materials can be utilized with ACS 300+ equipment. The system is designed to work with standard low viscosity resists such as AP-type HSQ-type (hexamethyldisilazane), AR-type (allyloxyresorcinol), and CP-type (cyanoacrylates) photoresists. It is also compatible with a variety of high viscosity photoresists such as PMMA-type (polymethyl methacrylate), AZ-type (aza-bisphenol), and MX-type (mercaptoxylene) photoresists. Overall, KARL SUSS / MICROTEC ACS 300+ photoresist unit is a versatile machine with a wide range of applications. It can easily handle a variety of photomasks and resist materials, making it suitable for both production and research. Its excellent versatility, user-friendly operation, and high precision capabilities make it an excellent choice for any photolithography project.