Used KARL SUSS / MICROTEC Delta 12 #293759851 for sale
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KARL SUSS / MICROTEC Delta 12 is a photoresist equipment designed to provide innovative solutions for affordable, quality deposition of photoresist on various substrate materials. Featuring a revolutionary optical exposure technology, MICROTEC Delta 12 offers a high resolution, consistent, and repeatable patterning process with analytical capabilities. Providing wafer diameters ranging from 6 inches to 12 inches, and a capacity of up to 6 process chambers, the system is an excellent choice for research and development (R&D) and production. Equipped with advanced automation process control, KARL SUSS Delta 12 offers a user-friendly interface for developers to manually configure their lithography process. To ensure accurate and reliable patterning, the unit is powered by a high-accuracy direct-drive linear motor. Additionally, it comes with industry-standard PECVD modules and a cutting-edge well-maintained coater track, enabling users to control film thickness and resist homogeneity. Delta 12 also features a state-of-the-art process chamber thermal isolated from outside influences. This feature provides a temperature-controlled environment for users to make accurate exposures and prevents deposition temperature fluctuations. The machine also makes use of advanced photonegative and photopositive technologies to enable users to conduct high resolution microfabrication. Other features include variable depth polymer etch, chemical milling process for internal structures, and variable power sensing. With its accurate positioning capabilities, users can choose a desired field size and reduce pattern distortions. KARL SUSS / MICROTEC Delta 12 tool also comes with advanced capabilities like fast exposure and gradient exposure processes. This feature allows uniform photoresist patterning across the wafer even in challenging geometries. Additionally, the asset offers very high process accuracy and repeatability even in challenging patterns. Overall, MICROTEC Delta 12 photoresist model is a reliable and highly accurate photolithography process with advanced functionalities. Its user-friendly interface and wide range of data collection capabilities make it an excellent choice for R&D and production. The equipment provides a complete solution for quality depositions, accurate patterning, and reliable resist homogeneity.
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