Used KARL SUSS / MICROTEC Delta 20T2/150VPO #9296246 for sale

KARL SUSS / MICROTEC Delta 20T2/150VPO is a photoresist equipment designed for imaging and patterning advanced semiconductor materials. MICROTEC Delta 20T2/150VPO is a comprehensive concept photoresist system that delivers a reliable and cost-effective solution for fabrication of semiconductor devices. The unit is made up of four key components: a photolithography tool (the Delta 20T), a resist coater, a developer, and a post-exposure bake (PEB) unit. The Delta 20T photolithography tool is a step and repeat machine designed for directly-written sub-micron lithographic imaging. It uses an ultraviolet (UV) light source and high-precision optics to project images onto a substrate. Additionally, the Delta 20T can also be configured for applications such as wafer scribing, metrology and other specialized applications. The tool has a 300-mm table and a 150-mm vertical travel range. The accompanying resist coater is an automated coating tool designed for precision application of a resist material onto a substrate. It uses a linear movement asset to uniformly and accurately apply the resist onto the material. The developer is a spin-based mechanism that is used to remove the resist after the exposure process. It uses centrifugal force to agitate the resist, which makes it easier for the chemical developer solution to dissolve the exposed resist material. Finally, the PEB oven is a specialty unit used to thermal-process the wafer after it has been exposed and developed. It uses a heating element to raise the temperature of the wafer to the optimal range for the resist development. Apart from its components, KARL SUSS DELTA 20T2 / 150VPO provides users with an intuitive graphical user interface (GUI). This interface is designed to help users perform programming tasks to set up the model for different processes and generate reports for analyzing equipment performance. DELTA 20T2 / 150VPO photoresist system delivers a comprehensive solution for imaging and patterning high-precision wafers. With its efficient workflow, superior image quality, and intuitive GUI, it is a reliable choice for fabricating advanced semiconductor components.