Used KARL SUSS / MICROTEC Delta 80 #293651532 for sale

KARL SUSS / MICROTEC Delta 80
ID: 293651532
Spin coater.
KARL SUSS / MICROTEC Delta 80 is a high performance photoresist exposure equipment that uses high intensity ultraviolet light exposure (UV) to produce photo-patterned resist layers on multiple materials. The system is well-suited for the production of high resolution, high aspect ratio micro-features on robust substrate materials such as silicon, gallium arsenide, and quartz. MICROTEC Delta 80 is comprised of a precision Z-axis stage, gantry, exposure assembly, and high intensity xenon lamps. The unit is designed to accommodate a wide range of exposure sections ranging from large-aperture approaches to traditional optical proximity exposure. It also provides the ability to integrate a wide variety of resist processing modules into the machine. KARL SUSS Delta 80 tool also offers a variety of versatile options such as XY-axis exposure, programmable exposure time, and fine focus control. This allows users to define complex pattern geometries and perform high resolution exposure with minimal feature distortion. The asset also includes advanced wafer handling mechanisms to optimize substrate handling and exposure uniformity. The model's extensive exposure controls also support flexible post-exposure processes. Its exposure assembly features a fast-swpping exposure head that can be quickly changed from one exposure plan to another. Additionally, the equipment can be integrated into advanced wafer trackers for automated alignment and exposure, enabling quick prototyping of new designs. In order to provide a high degree of accuracy in exposed patterns and features, Delta 80 also features high-precision optical proximity correction (OPC) and overlay optimization capabilities. A combination of laser modulation and application of digital signal processors (DSPs) allows users to compensate for substrate topography and varying geometries of exposed patterns. By combining these features, KARL SUSS / MICROTEC Delta 80 system can be used to produce high resolution photoresist patterns on various materials that are highly accurate and require minimal feature distortion. With its fast exposure speed, adaptable exposure assembly and OPC capabilities, MICROTEC Delta 80 is an ideal unit for both prototyping and commercial production applications.
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