Used KARL SUSS / MICROTEC Delta 80RC #9296257 for sale

KARL SUSS / MICROTEC Delta 80RC
ID: 9296257
Coater system.
KARL SUSS / MICROTEC Delta 80RC Photoresist Equipment is an advanced and reliable lithography system used for photoresist processing. It is designed to give precise control in photoresist jobs, such as grinding, cleaning, and coating. The unit includes a fully automated controller allowing for easy setup, operation, and maintenance. MICROTEC Delta 80RC is an ideal machine for photolithography jobs due its unique features, including a high-resolution image registration tool and an automated pneumatic stage. The image registration asset allows for highly accurate alignments and registration of images up to 0.1 μm precision, while the automated pneumatic stage ensures fast, accurate and reliable stage movements. The model also features a fully adjustable light source, which is able to adjust the beam size and intensity to match the lithography job being performed. This allows for a wide range of photoresist projects to be completed with precision and accuracy. The robustness of KARL SUSS Delta 80RC is due to its numerical precision positioning and rich software library. Its numerical precision positioning allows for reproducible and precise positional tolerances in the order of 0.1 μm. The rich software library provides an extensive range of processes including Exposed Imaging, Development, Grinding, Cleaning, Coating, and more. The Delta is also able to pair be with many photochemical tanks for automated wet processing. Delta 80RC equipment is designed with durability in mind, and features all-metal construction and a durable finish, guaranteeing long-term stability and strength. The system also comes with a low maintenance option for added convenience. In summary, KARL SUSS / MICROTEC Delta 80RC Photoresist Unit is the ideal choice for photolithography jobs. Its high-resolution image registration machine, automated stage, low maintenance option, and numerical Precision makes this tool ideal for precision and reliable photoresist processing.
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