Used KARL SUSS / MICROTEC Delta 80T #293682013 for sale

KARL SUSS / MICROTEC Delta 80T is a photoresist equipment designed for processing thin and delicate substrates, such as thin oxides, thin membranes, and thin films. This system consists of a vacuum-tight, low energy light exposure mechanism, a heated substrate stage and a chemical reservoir. The exposed substrate material can be changed rapidly and the unit offers an adjustable resolution and mask size. MICROTEC Delta 80T is equipped with a digital exposure parameter display featuring exposure time, intensity and detector readings and is based on a digital signal processor (DSP). This feature allows users to optimize their exposure parameters with a high degree of accuracy, as well as to monitor the exposure process. The machine also has an USB port which is used to connect the tool to a personal computer and transfer exposure parameters. KARL SUSS DELTA 80 T has an advanced exposure sequence control that allows for multiple exposures to be run in one session, allowing for the rapid optimization of the exposure parameters. This asset also features an adjustable substrate temperature, which is essential when processing thin and delicate materials. The highest temperature is 110°C (230°F) and the lowest is -30°C, which is adequate for most photoresist processes. KARL SUSS Delta 80T has a powerful chemical reservoir designed to provide a constant supply of developing agents, solvents, and other essential materials. This model also features an adjustable mask size, enabling a broad range of applications. DELTA 80 T can cover substrates up to 8-inches (20.3 cm) in diameter. MICROTEC DELTA 80 T is user-friendly and easy to operate. It has a unique arch-shaped, vacuum-tight light exposure mechanism, which allows for the delivery of low energy light. This feature increases the accuracy of the processing and reduces the energy required for each exposure step. Delta 80T is an excellent choice for fine patterning and creating thin films, as it is capable of processing fine and delicate substrates as small as 0.5 microns. It is also suitable for research and development of new photoresist processes and materials.