Used KARL SUSS / MICROTEC Delta 80T2 #9157254 for sale

ID: 9157254
Vintage: 2005
Resist coater 2005 vintage.
KARL SUSS / MICROTEC Delta 80T2 is a versatile photoresist equipment that is primarily used for exposure of photoresist materials. This exposure system consists of a unit chamber, a track, and a resist box. The machine chamber is equipped with optical devices and a light source. The track is responsible for traversing the tool chamber to move images throughout the optical window. The resist box contains substrates, which are the materials that are exposed to the photoresist material. The light source is one of the most important parts of the asset and allows for the manipulation of patterns. This is important because patterns are created using the photoresist materials and need to be finely manipulated. The light source is adjustable and can be used to adjust the intensity of the light emitted, which will result in different types of exposure depending on the type of photoresist material. The model also utilizes a coating device to coat the photoresist materials on the substrates. The coating process is important to create the desired patterns on the substrates. There is a variety of coating materials to choose from including, polymethylmethacrylate, polyacrylonitrile, polyimide, polyethylene terephthalate, polyvinyl acetate, and polycarbonate, among others. The selection of the coating materials will determine the type of exposure to the photoresist material. The equipment is also equipped with a scanner and a controller. The scanner is responsible for scanning the substrates and capturing images for further manipulation and the controller controls the parameters of the system to ensure accuracy and repeatability in the imaging process. Finally, the unit is also equipped with a post-exposure bake unit. This unit is responsible for baking the exposed photoresist material after the exposure process. This is necessary to ensure that the photoresist material has been uniformly exposed across the substrate. The baking process changes the chemical binding of the photoresist material, allowing it to be developed and providing patterns on the substrate. In conclusion, MICROTEC Delta 80T2 is a versatile photoresist machine that is used to manipulate patterns using photoresist materials. The tool has a range of optical devices, light source, scaners, controllers and coating materials to provide customization to the imaging process. Furthermore, the asset also has a post-exposure bake unit to ensure uniform exposure across the substrate. This model is therefore ideal for creating high-resolution patterns for a range of applications.
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