Used KARL SUSS / MICROTEC Falcon #293652799 for sale

KARL SUSS / MICROTEC Falcon is a high performance Photoresist (PR) equipment designed to provide advanced features for photomask and semiconductor device production. The system is equipped with a large, vacuum-floating, coating head that is capable of coating up to three different resists on a single substrate, including dry-film photoresists, spun-on photoresists and liquid lithography resists. The subsurface heating unit provides uniform temperature control and highly uniform resist coatings. High resolution exposures are achieved through the alignment of a laser interferometer with the optical axis of the machine. The detector plane can be adjusted to within 5 microns of the optical axis. The closed-loop exposure substrate stage control ensures highly repeatable lithography processes. The tool is also capable of handling complicated pitches and high aspect ratios which are essential for advanced lithography. The asset provides optimal imaging through simultaneous alignment of the photomask and substrate, allowing for critical alignment of the patterns onto the substrate with minimal positional shifts. This feature ensures accurate printing of the structrues onto the substrate with high accuracy. MICROTEC Falcon is a highly versatile model with user-friendly software for easy equipment set up. It allows for single-step lithography processes, eliminating the need for multiple steps such as pre-imagiing before actual exposures. This feature saves time and increases the production throughput. The state-of-the-art software included with the system includes features such as multi-level prescan, multi-step resist optimization, advanced mask correction, adaptive pattern recognition as well as step and repeat lithography set up. The unit is also capable of handling advanced printing requirements. It includes special features such as optical gray scale generation and adjustable film back-bias for binary and phase shift mask exposures. This feature provides a wide variety of treatment combinations for different applications. KARL SUSS Falcon is an advanced photoresist machine which provides a broad range of features for mask and device production. It provides accurate and repeatable lithography processes for precise pattern printing and exposes a wide range of photomask types. With its advanced software and precise control, this tool is an excellent choice for advanced substrate processing.