Used KARL SUSS / MICROTEC Falcon #293659990 for sale

KARL SUSS / MICROTEC Falcon
ID: 293659990
PI Coater system.
KARL SUSS / MICROTEC Falcon is a photoresist equipment that is a combination of stepper and mask alignment equipment. It is the best in its class for processing very small structures and components. MICROTEC Falcon is an innovative system for preparing a substrate, applying photoresist and then using a photolithographic technique to transfer a pattern into the resist. The main feature of KARL SUSS Falcon photoresist unit is its precision, which maintains a positional accuracy of 0.1 µm. This makes Falcon an ideal choice when working with extremely tiny components. The machine is also capable of performing submicron alignment which allows for tighter features. KARL SUSS / MICROTEC Falcon increases throughput and reduces cost by utilizing full-frame processing and zoom-in alignment. MICROTEC Falcon also features advanced photoresist technologies like deep ultra-violet (DUV) lithography. This technology creates a response for resist that is three times faster than conventional photoresist systems. Making use of KARL SUSS Falcon's integrated software, users can program various accessory functions such as stepper motor control, shutter control and advanced diagnostics. Each of these features further enhances the performance of Falcon. Due to its accurate and reliable performance, KARL SUSS / MICROTEC Falcon is widely used in the semiconductor industry. It is ideal for a variety of applications such as MEMS, ASICs, SIPs, and NEMS. The microelectronics industry relies heavily on MICROTEC Falcon to produce nano scale features and maintain their structural integrity. The tool is also well-suited for thin-film deposition and surface-treatment processes. KARL SUSS Falcon is a cost-effective and efficient asset that ensures high- quality results. It offers uniformity during the photoresist process and eliminates any chance of contamination. With its unique features and advanced technologies, Falcon is considered to be one of the most accurate photoresist systems in the world today.
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