Used KARL SUSS / MICROTEC Falcon #9211225 for sale

KARL SUSS / MICROTEC Falcon
ID: 9211225
Vintage: 2002
Coater / Developer system 2002 vintage.
KARL SUSS / MICROTEC Falcon is a high performance, flexilexible photolithographic equipment for advanced direct imaging and wafer coating solutions. It is comprised of a user-friendly, modular, and highly sophisticated platform with advanced robotics, allowing for precise alignment, full automation of processing sequences, and high-precision results. MICROTEC Falcon system utilizes top-notch optics, lasers, and photo-optics to generate virtually perfect patterns down to 25nm or below, and is capable of batch processing substrates from 3 to 8-inch diameters. The industry-leading recipes for photoresist coated wafers are based on strict standards, providing high throughput, reliable production, and easy reproducibility. The unit includes a high resolution 6-megapixel camera for detection of beam blanking and a high resolution video microscope that allows for image processing, wafer alignment, and particle analysis. The automated exposure bays make for accurate and consistent exposure of photoresist, with typical overlay uniformity of 0.1-0.2 microns or better. The integrated Opticron alignment stage provides a seven-axis alignment machine, while a sample metrology tool makes for an incredibly precise and reliable process window. A Nion microwave accelerator is located upstream, eliminating the need for a high level of process refinement, allowing for quicker process times and higher resolution. KARL SUSS Falcon asset also features integrated automation for 3D feature detection, smart arm technology, and wafer handling systems that optimise throughput. Finally, interlocks that ensure the chamber is up to standard for processing sensitive materials such as a cleanroom environment, help to make your manufacturing process efficient and controlled. Falcon model brings advanced photolithography to the next level, with a stainless steel platform and integrated robotic equipment that make it perfect for industry-standard photoresist applications. It's ability to process substrates up to 8-inch in size, and it's world-renowned accuracy, makes it an excellent choice for demanding photolithographic applications.
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