Used KARL SUSS / MICROTEC Falcon #9215560 for sale

ID: 9215560
Wafer Size: 8"
PI Coater, 8" Operating system: Windows XP I/O Robot movement: I/O Module User interface: Tri-color lamp tower Audible alarm Keyboard Trackball Wafer handling: (4) Cassettes (Input port) Handling robot Pre-aligner Coating module: Arm movement Chuck spin Lift pin movement Weight scale Chemical dispense Lift pin movement: Temperature module Cooling module Utility: N2: 3.5 bar CDA: 4 bar Vacuum Power: 3 x 400 V +6% - 10 % +N + PE 50 Hz.
KARL SUSS / MICROTEC Falcon is an advanced photoresist equipment that enables users to create micron-scale structures on their prototypes. This ultra-precise photolithographic technology is capable of producing high-resolution features that are down to 0.4 micrometers in size, as well as up to 50 microns thick. MICROTEC Falcon's advanced system includes many features such as a high-resolution photo printing unit, a power collector, a heated support stage, a stage-leveling machine, and a mask-aligned tool. The included photo printing asset enables users to achieve precise, high-resolution images, down to 0.4 microns in size. The power collector is an integrated device that helps to ensure that exposure and development levels remain consistent throughout the process. The model also includes an integrated heated support stage, which ensures optimum quality patterns and minimizes image distortion. Additionally, the stage-leveling equipment is allows the user to adjust the alignment of the mask elements across the sample surface. Finally, the mask-aligned system helps to ensure that the mask elements remain accurately aligned across the sample surface. In addition to its photoresist capabilities, KARL SUSS Falcon is also capable of etching and metallization of patterns on substrates. This allows the user to transfer their patterns onto a variety of surfaces, including glass, tapes, or sheet-metal, for a wide variety of applications. The etching and metallization processes are often used in combination with the lithography to create three-dimensional structures on the substrates. Falcon is an advanced photolithography unit that is ideal for precise creation of micron-scale structures. Its features, including high-resolution photo printing, a power collector, a heated support stage, a stage-leveling machine, and a mask-aligned tool, enable users to achieve optimum quality patterns with minimal distortion. Its capabilities extend beyond photoresist with the ability to etch and metallize patterns onto various substrates, for a wide variety of applications.
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