Used KARL SUSS / MICROTEC Falcon #9247695 for sale

KARL SUSS / MICROTEC Falcon is a photoresist equipment designed for the manufacture of micro and nano electromechanical systems (MEMS and NEMS). The system comprises of a 3-axis stage with a built-in vacuum unit and a modular shelf-mountable optical platform. It is equipped with a high precision micronuvex optical machine providing up to 100nm accuracy and repeatability, as well as a 0.6um resolution digital Z-axis scanner. It also features a high speed laser wafer scriber to increase accuracy, speed, and productivity. MICROTEC Falcon has a high-speed motorized Z-Axis allowing for movement of up to 5nm/s. It is user-friendly, featuring a touchscreen user interface and multilingual options. The easy-to-use interface provides up and down speed selection with various pre-defined settings and allows for the programming of complex 3D patterns. KARL SUSS Falcon is designed to handle multiple resist types ranging from thick to thin with a uniform thickness. The built-in spin chuck tool automatically adjusts to the appropriate substrate height with an automatic top/bottom coating feature. The alignment of the two-axis wafer alignment asset can be adjusted to any depth and width. The model supports various vacuum levels ranging from 10-7 to 102 torr allowing for high quality processing and long-term maintenance. The automatic vacuum generation ensures optimal vacuum pressure, while the built-in degassing equipment maintains the operations of the galvanometer by preventing short-time changes. The system is also equipped with a gas shock absorber that reduces the vibration created by external sources, resulting in better accuracy during the photoresist exposure process. Falcon is designed with the highest safety standards in mind, meeting all applicable CE requirements. The unit is designed to operate with most standard safety protocols such as lockout/tagout, hazardous material handling, and EPA/OSHA requirements. Overall, KARL SUSS / MICROTEC Falcon is a versatile and reliable photoresist machine designed to meet the needs of manufacturers in the micro and nano electromechanical systems industries.