Used KARL SUSS / MICROTEC Gamma 4M #293601750 for sale

KARL SUSS / MICROTEC Gamma 4M is a photoresist equipment designed for the precise and precise development of photoresists. It is a compact and robust photolithography system that can meet the demanding requirements of modern nanofabrication and optoelectronic applications. MICROTEC Gamma 4M consists of an excimer laser, a template generator, a pattern generator, an orthogonal stage, a Mask Aligner and a metering unit. The excimer laser is based on MICROTEC latest laser platform and features a state-of-the-art wavelength control machine, providing the highest repeatability and accuracy during exposure. The beam profile of the laser is designed to evenly expose uniform resist structures in a very short time. The template generator uses a high-resolution LCD to enable advanced mask patterns such as SU-8, AZ-5214 and advanced integration structures. The LCD is optimized for a low but very precise depth of focus that allows for state-of-the-art resolution levels. The pattern generator uses a laser writing tool which is specifically designed for the deposition of high-precision and sub-micron structures for photolithography. The orthogonal stage allows for precise and accurate alignment of the Mask Aligner and the pattern generator. The Mask Aligner provides the highest resolution possible during development and features a high-precision, height-adjustable design that allows for even exposure across entire photoresist areas. Finally, the metering asset ensures that all parameters of KARL SUSS Gamma 4M are up to the required standards and specifications. Gamma 4M model offers one of the most advanced photoresist processes available in the market today. It is an ideal choice for professional nanofabrication and optoelectronic laboratories as well as research and development institutions. By offering features such as a high-resolution laser writing equipment, an advanced LCD screen, and a height-adjustable Mask Aligner, KARL SUSS / MICROTEC Gamma 4M is one of the most reliable and precise photoresist systems available today.