Used KARL SUSS / MICROTEC Gamma 4M #293831196 for sale

KARL SUSS / MICROTEC Gamma 4M is a photoresist equipment designed for precise and accurate photolithography processes. This system allows users to pattern surfaces with micron and sub-micron resolution levels. MICROTEC Gamma 4M features an automated 6-axis computer-controlled stage, allowing for precise positioning of the substrate with respect to the addition/making optics of the piece. The unit also contains a UV illumination machine, enabling a uniform light intensity. This light exposure, based on pre-defined parameters, etches the necessary patterns on the substrate. KARL SUSS Gamma 4M also contains an automated proximity and focus focus detection tool. This asset ensures that the substrate is always in optimal position with respect to the patterning optics, ensuring the highest degree of accuracy for the photolithography process. In addition, Gamma 4M has a built-in thermal protection model that allows users to maintain proper working temperatures across the entire substrate. Due to its precise surface patterning capabilities, KARL SUSS / MICROTEC Gamma 4M is an ideal tool for applications such as wafer manipulation, masking, and direct-write lithography development. This equipment is highly compatible with a variety of hard substrates, including silicon wafers, quartz, ceramic, and sapphire. MICROTEC Gamma 4M allows users to apply complex patterns to curved, flat, or folded samples, allowing for high flexibility in the application of the desired design. Given its diverse capabilities, KARL SUSS Gamma 4M offers a wide range of features to satisfy the needs of many applications. It is compatible with a variety of materials such as PMMA, polyimide, SU-8, and photoresist. Gamma 4M is also a highly precise and efficient photolithography tool due to its incorporation of a laser exposure system, automated alignment, and automated focus detection and correction unit. Overall, KARL SUSS / MICROTEC Gamma 4M is an excellent photoresist machine designed to facilitate precision photolithography processes. It is capable of producing a variety of patterns on hard substrates of varying shapes and sizes, offering flexibility and accuracy for many applications. The automated positioning and thermal protection systems ensure optimal working conditions for the user, while the laser exposure tool and automated focus detection and correction asset ensure unparalleled accuracy and resolution for the photolithography process.