Used KARL SUSS / MICROTEC Gamma 80 #293652803 for sale

KARL SUSS / MICROTEC Gamma 80 is a high performance photoresist equipment used in microfabrication and reticle making. It is designed to create reliable, reproducible and dependable features on devices and components used in the semiconductor industry. This system is an integral part of device fabrication for electronics, optical and bioengineering production applications. MICROTEC Gamma 80 photoresist unit utilizes a thermally-stable, mono-layer resist material deposited onto the substrate. This resist material is designed to be sensitive to UV exposure or e-beam exposure which facilitates the creation of nanoscale patterns and designs. Once exposed, the remaining resist functions as a protective coating on the device or component which allows for further processing. KARL SUSS Gamma 80 photoresist machine features precision, accuracy and repeatable results that are required for complex patterns. It utilizes a high-resolution alignment tool with elevated stage capabilities to ensure precise placement and patterning of features. It also includes advanced pattern recognition software and data storage, allowing users to quickly retrieve and duplicate designs. In addition to its pattern recognition capabilities, Gamma 80 photoresist asset includes an array of features that make production more efficient. It is equipped with an advanced pre-on layer application model which automatically applies the resist layer, ensuring a stable and uniform coating. This equipment also includes a vari-focal optics system which can be used to vary the exposure duration and intensity of UV exposure. KARL SUSS / MICROTEC Gamma 80 photoresist unit offers high levels of reliability and dependability, making it a favorite choice among manufacturers. Its high precision and accuracy make it an effective tool in device fabrication, giving users the ability to create nanoscale, complex patterns. Overall, MICROTEC Gamma 80 photoresist machine is an advanced tool designed to yield reliable, reproducible and dependable features for both industrial and research applications.