Used KARL SUSS / MICROTEC Gamma 80 #9269957 for sale

KARL SUSS / MICROTEC Gamma 80 is a state-of-the-art photoresist equipment designed for microfabrication applications. This system uses a combination of UV-sensitive photoresist and a long-wavelength lithography exposure source to produce high-quality images in photoresist materials. The exposure source used in MICROTEC Gamma 80 is a 10mJ long-wavelength laser operating in the range of 365nm, which is almost twice the wavelength of traditional ArF-based systems. This enables smaller feature sizes, with the highest line-width possible of 10nm. At the same time, this also allows for greater control of the exposure times and energies required for the photoresistance process. KARL SUSS Gamma 80 unit has a maximum resolution of 5.5 μm and an optical alignment accuracy of 5 μm when imaging onto photoresist materials. This ensures that high-resolution patterns can be created in photoresists, allowing for the fabrication of complex devices or components in the micro- and nanoscale. More specifically, Gamma 80 allows for the deposition and lithography of thick SU-8 photoresist with thicknesses up to 20μm and castable Ultra-Thin (Ultra-Thin) photoresists with thicknesses up to 0.45μm. The machine also has an integrated pellicle, which helps protect the substrate during the exposure. In addition, KARL SUSS / MICROTEC Gamma 80 also offers a variety of cleanroom solutions, such as automated photoresist spinning and baking, leading to a simplified and precise photoresist process. These solutions allow for greater process consistency and uniformity, resulting in high-yield results. Finally, MICROTEC Gamma 80 offers an advanced software package to control the process. This software allows for full monitoring and adjustment of the tool parameters, including laser power, exposure time, and other advanced parameters. The software also provides a set of user-friendly tools that can be used to quickly adjust asset settings and view images, allowing for quick and effortless operation. All in all, KARL SUSS Gamma 80 is an advanced and powerful photoresist model, offering high-resolution imaging, automated processes, and advanced software to help achieve the production of complex patterns in photoresist materials.