Used KARL SUSS / MICROTEC Gamma #293586449 for sale
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ID: 293586449
Wafer Size: 6"-8"
Vintage: 2010
Developer system, 6"-8"
(2) Port cassettes
(3) Developer units
(5) Hot plates
(2) Cold plates
2010 vintage.
KARL SUSS / MICROTEC Gamma is a state-of-the-art photoresist equipment primarily used in the field of advanced photolithography. A photoresist is a material that is sensitive to light, which allows for etching and structuring of microstructures and other tiny circuit elements. MICROTEC Gamma has a maximum resolution of 0.5 µm for patterning on mask substrates such as quartz, SiC, diamond, and other materials, and it is compatible with a variety of industry-standard photoresists. KARL SUSS Gamma makes use of off-axis projection aligners, which provide a higher level of accuracy and alignment than other processes used in photolithography. Consequently, Gamma yields more precise microstructures in less time that lead to increased efficiency and reliability. With exposure times as short as 0.06 seconds and patterning with up to six alignment marks, this photoresist system is significantly faster than its counterparts as well. In addition to its advanced projection aligners, KARL SUSS / MICROTEC Gamma also has an automated backside alignment option incorporation, which allows quick and easy corrections of any misalignments. This feature is crucial for achieving the highest level of accuracy and reliability. The unit also offers fully automated in-situ rapid-developing technology, enabling even faster and simpler exposure processes. Another advantage of MICROTEC Gamma lies in its user-friendly features. With simple, intuitive software, its operating machine is designed to require minimal user input, thus allowing anyone to use the tool with little to no technical know-how. Additionally, the asset can be programmed to accommodate those users with a more advanced skill set, giving them the power to customize the model according to their needs. Overall, KARL SUSS Gamma is an advanced, highly efficient photoresist equipment, with a broad range of automatic, intuitive, and customizable features that make it an ideal choice for photolithography. With its high level of accuracy, fast exposure, and automated alignment and developing capabilities, Gamma can be counted on to produce consistent and reliable results, with minimal input from the user.
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