Used KARL SUSS / MICROTEC Gamma #293617131 for sale
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ID: 293617131
Wafer Size: 6"-8"
Vintage: 2010
Developer system, 6"-8"
(2) Port cassettes
(3) Developer units
(5) Hot plates
(2) Cold plates
2010 vintage.
KARL SUSS / MICROTEC Gamma is a photoresist equipment that enables the generation of high resolution and accurate patterns of various types of micro-structures. It can be used for a variety of applications, including the manufacture of electronic circuits, MEMS and optoelectronic components. The system consists of a mask aligner, a small processor, and a plasma-activated wet etching module. The mask aligner holds the photomask and performs the photolithographic patterning processes on a stepper platform and allows for precise alignment of the mask over the substrate. The small processor receives the pattern data from the photomask, and processes it to create the photoresist pattern on the substrate. The plasma-activated wet etching module is used to etch and remove the exposed areas of the substrate. MICROTEC Gamma unit offers the user control of the process parameters such as exposure dose, illumination pattern, and exposure time. These enable the optimization of process variables to produce high resolution and accurate pattern lines and features. The machine is equipped with high precision lenses, a highly intuitive user interface, and software that enables the user to design patterns and adjust parameters. KARL SUSS Gamma tool provides a wide range of features that make it an appropriate choice for applications such as the fabrication of printed circuit boards, MEMS and optoelectronic components. It helps reduce the time and cost associated with the manufacturing process by providing a highly accurate pattern generation and alignment process. Gamma asset is designed to be reliable and easy to operate, allowing the user to quickly and easily create high quality micro-patterns. It can be used in a variety of temperature and humidity conditions and is available with a wide range of tools to help develop intricate patterns in a timely and cost-effective manner. The model is ideal for the creation of complex micro-patterns on a wide variety of substrates, making it an excellent choice for manufacturing applications.
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