Used KARL SUSS / MICROTEC Gamma #293778062 for sale

KARL SUSS / MICROTEC Gamma is a photoresist equipment used in the fabrication of micro-electrical and optical components. It is designed to handle multiple photoresist types and processes simultaneously while providing high accuracy and repeatability in the etching process. "MICROTEC Gamma is an all-in-one DL-2Y photoresist system which combines both extremely transparent and chemically resistant DL-2Y photoresist both of which are commonly used as a mask for lithography and dry etching. The DL-2Y photoresist is polymer-based and therefore can be used for both optical and x-ray microlithography. KARL SUSS Gamma unit provides an automated solution for photoresist coating and development. This eliminates the need for manual applications and offers a much higher degree of control over the photoresist layer thickness. The machine provides a cantilevered automatic wafer loader that includes advanced hardware interfaces, allowing for flexible control over material distribution and photoresist pre-bake parameters. A built-in scanhead is designed to improve alignment accuracy with an accuracy of up to +0.1 um. In addition, Gamma tool features a high-resolution digital imaging asset for greater accuracy in image visualization. KARL SUSS / MICROTEC Gamma utilizes a two-stage heating and cooling model to achieve ideal photoresist curing and development. It also features integrated lift pins for accurate placement of the photoresist mask during etching. A dual-density PTFE-coated conveyor allows for easy loading and unloading of wafers from the chamber. MICROTEC Gamma provides a wide variety of options for diameters, coating thicknesses, and film materials, making it highly customizable for specialized tasks. Finally, KARL SUSS Gamma equipment features an advanced backlit viewing system for easy detection and inspection of defects. It is also designed with an intuitive graphical user interface and is extremely user-friendly. With Gamma photoresist unit, operators can minimize photoresist cracking, edge-roll off, and critical dimension loss, resulting in quality microelectronic and optical components.